EUV Sources for Lithography

Editeur: SPIE Press
An authoritative reference book on EUV source technology. Topics range from an overview of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of DPP and LPP designs and other technologies for producing EUV radiation.
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ISBN / EAN 9780819458452
Editeur SPIE Press